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Schematic showing different scenarios in electroplating. (a) faster
Huiqin LING, Shanghai Jiao Tong University, Shanghai, SJTU, State Key Laboratory of Metal Matrix Composites
PDF) Thermal stresses and deformations of Cu pillar flip chip BGA package: Analyses and measurements
3D Reconstruction and Characterization of Polycrystalline Microstructures Using a FIB–SEM System
The effect of lanthanum chloride on the electrocrystallization behavior of cobalt and grain refinement in deposition layers
Mechanical properties of Cu pillar flip chip package
3D Reconstruction and Characterization of Polycrystalline Microstructures Using a FIB–SEM System
Materials, Free Full-Text
Linear Sweep Voltammetric Study on the Copper Electrodeposition of Though-Silicon-Vias
Effect of die/substrate thickness ratio on Al pad stresses, under a
Enhanced electromigration resistance through grain size modulation in copper interconnects